Nanotech 2014 Vol. 3
Nanotech 2014 Vol. 3
Nanotechnology 2014: Electronics, Manufacturing, Environment, Energy & Water

Materials for Sustainability & Efficiency Chapter 3

Three-Dimensional High-order Nano-rod Formation Using a Hydrogen-assisted Deep Reactive Ion Etching

Authors: S. Soleimani, S. Zanganeh, S. Azimi, Z. Sanaee, S. Mohajerzadeh and H. Taghinejad

Affilation: University of Tehran, Iran, Islamic Republic of

Pages: 190 - 193

Keywords: nano-rods, 3-D features, amorphous silicon

We report the formation of three-dimensional nano-sized vertical features on amorphous silicon by means of a hydrogen-assisted deep reactive ion etching. The thickness of amorphous silicon has been varied between 5 and 10 µm. The adhesion quality of relatively thick amorphous Si films has allowed deep micro and nano-machining features on silicon and glass substrates. Apart from optical photo-lithography, high precision nano-sphere colloidal lithography and electron beam lithography has been exploited to realize ultra-small features on the amorphous silicon. Scanning electron microscopy has been extensively used to study the evolution of three-dimensional features. Such 3-D structures are suitable for future MEMS-based devices on glass and silicon substrates.

ISBN: 978-1-4822-5830-1
Pages: 588
Hardcopy: $209.95