Authors: Y.B. Chung, J.S. Lim, J.K. Kim, N.M. Hwang, H. Kim, Y.J. Park
Affilation: Seoul National University, Korea
Pages: 134 - 136
Keywords: HWCVD, microcrystalline silicon, solar cell, photoconductivity
High quality microcrystalline silicon thin film grown by Hot-Wire Chemical Vapor Deposition(HWCVD) and subsequently manufactured solar cells are presented. Intrinsic layer photoconductivity data is provided for one of the film quality measures, and the result is about 3 times higher than previously reported best record. We propose two-step microcrystalline silicon film growth mechanism, in which silicon nanoparticles are formed in the gas phase and subsequently incorporated into a solid film on glass substrates.
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