Authors: W. Wu, D. Dey, O.G. Memis, A. Katsnelson, H. Mohseni
Affilation: Northwestern University, United States
Pages: 574 - 577
Keywords: microspheres, lithography, nanoholes, nanopillars
We present a low-cost and high-throughput process for realization of two-dimensional arrays of deep sub-wavelength features using a self-assembled monolayer of HCP silica and polystyrene microspheres and well-developed photoresist lithography. This method utilizes the microspheres as super-lenses to fabricate highly uniform nano-holes and nano-pillars arrays over large areas on conventional positive and negative photoresists, and with a high aspect ratio. The period and diameter of the holes and pillars formed with this technique can be controlled precisely and independently. We also present our 3-D FDTD modeling, which shows a good agreement with the experimental results. The technique is simple, fast, economical, and is a convergence of bottom-up and top-down lithography.
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