Nanotech 2005 Vol. 3
Nanotech 2005 Vol. 3
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3

Nano Scale Electronics Processing Chapter 4

Resolution Enhancement in Nanoimprinting by Surface Energy Engineering
G.Y. Jung, W. Wu, Z. Li, S.Y. Wang, W.M. Tong and R.S. Williams
Hewlett Packard Laboratories, US

Wafer Scale Aligned Sub-25nm Metal Nanowires on Silicon (110) using PEDAL Lift-off Process
S.R. Sonkusale, C.J. Amsinck, D.P. Nackashi, N.H. Di Spigna, D. Barlage, M. Johnson and P.D. Franzon
North Carolina State University, US

Self-Assembled Cluster Nanostructures and Nanodevices
S.A. Brown, J. Partridge, S. Scott, R. Reichel, A. Ayesh and K.C. Tee
Nano Cluster Devices Ltd, NZ

Aspect Ratio Improvement using the 2-step NERIME FIB Top Surface Imaging Process for Nano-lithography Applications
K. Arshak, S.F. Gilmartin, D. Collins, O. Korostynska and A. Arshak
University of Limerick and Analog Devices, IE

Low Voltage Electron Beam Lithography in PMMA
M. Bolorizadeh and D.C. Joy
University of Tennessee, US

Au Nano-Wire Transferring onto HSQ by Nano Imprinting Technology
J.F. Liu, Y.J. Hsu, J.H. Chen, F.S. Huang and S.Z. Chen
National Tsing Hua University, TW

Sub-100nm and Large Area Pattern Process using by Hybrid Nanocontact Printing (HnCP)
J. Jo, K-Y Kim, D-S Choi and E-S Lee
Korea Institute of Machinery & Materials(KIMM), KR

A Highly Reliable Pattern Transfer of Hydrogen Silsequioxane
J.F. Liu, S.Z. Chen, H.J.H. Chen and F.S. Huang
National Tsing Hua University, TW

Nanoscale Reaction Analysis of Resist Materials for Nanolithography
T. Kozawa, A. Saeki, K. Okamoto and S. Tagawa
Osaka University, JP

Nano Tungsten Silicide Thin Film Deposition and its Integration with Poly-Silicon
M. Li and R. Suryanarayanan Iyer
Applied Materials Inc., US

ISBN: 0-9767985-2-2
Pages: 786
Hardcopy: $109.95