Malladi K., Wang C., Madou M.
University of California Irvine, US
Keywords: C-MEMS, NEMS, photoresist, pyrolysis, suspended structure
Recently suspended C-MEMS structures were fabricated by accurately controlling the processing parameter. However how to fabricate various suspended C-NEMS structures is still a big challenge. Here we successfully fabricated C-NEMS by UV/EB lithography and pyrolysis method. In this work, first we use SU-8 negative photoresist and UV lithography to make microscale SU-8 post pattern. Before developing, by using EB writer, nanoscale patterns were written at the SU-8 subsurface connected to microscale post. After developing the photoresist, we put the sample in furnace and pyrolyzed it at 900 oC to convert the SU-8 structure to carbon MEMS/NEMS. In this work, we tried to solve charging problem by forming a thin metal layer before EB writing using various methods, such as EB evaporation, sputtering system and thermal evaporation. By partly depositing a thin layer of a metal to prevent the repelling of negative charged electrons, we have successful formed various suspended carbon structures, such as bridges and networks. Figure 1 (a) and 1(b) shows two typical SEM pictures of suspended C-MEMS/NEMS. Possible application will be discussed in this presentation.
Journal: TechConnect Briefs
Volume: 2, Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
Published: May 8, 2005
Pages: 159 - 162
Industry sector: Advanced Materials & Manufacturing
Topic: Carbon Nano Structures & Devices
ISBN: 0-9767985-1-4