Nanotech 2003 Vol. 1
Nanotech 2003 Vol. 1
Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 1

Wafer and MEMS Processing Chapter 13

A New, Topology Driven Method for Automatic Mask Generation from Three-Dimensional Models

Authors: R. Schiek and R. Schmidt

Affilation: Sandia National Laboratories, United States

Pages: 506 - 509

Keywords: mask generation, topology, mems design

We have developed an algorithm which when given a three-dimensional object can infer from the objects topology the two-dimensional masks needed to produce that object with surface micromachining.Our algorithm, called Faethm, calculates the required two-dimensional mask set needed to produce a given three-dimensional model. Unlike earlier approaches, this algorithm does not involve the creation of trial masks that are iterated through a process simulator [2, 4] Nor does this method use a geometry decomposition that is limited to non-isotropic etching processes [1]. Rather, the basis of Faethm is an analysis of the vertical topology of the three-dimensional model coupled with a constrained optimization to meet specific production process requirements.This algorithm has been developed with Sandias SUMMiT~V process [3] as an initial design goal though it can be adapted to other processes as only the constrained optimization step would change. Validation of this algorithm has started with three-dimensional models and two-dimensional mask sets of parts common to the SUMMiT~V process such as connectors, gears, transmissions, actuators and motors.

ISBN: 0-9728422-0-9
Pages: 560