MSM 99
MSM 99
Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems

Process Modeling Chapter 4

Design of Compensation Structures for Anisotropic Etching

Authors: M.K. Long, J.W. Burdick and E.K. Antonsson

Affilation: California Institute of Technology, United States

Pages: 124 - 127

Keywords: compensation structures, anisotropic etching, wet etching, bulk etching

Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask layouts for wet etching.This paper extends that work to broader classes of corner compensation and demonstrates the encoding of a specific compensation structure uch that it may be used with other orientation or process parameters.

ISBN: 0-9666135-4-6
Pages: 697

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