Authors: L. Latorre, Y. Bertrand, P. Hazard, F. Pressecq and P. Nouet
Affilation: LIRMM-CNRS, France
Pages: 620 - 623
Keywords: MEMS, magnetic field sensor, modeling, design optimization
Silicon etching at low temperature offers the possibility of manufacturing monolithic sensors with associated electronics. For a given technology, the so-called FSBM, we have established a set of relations to describe the mechanical behavior of an elementary device, the cantilever beam. We have then used these relationships for the performance evaluation and optimization of a magnetic field sensor based on the Lorentz force actuation of a ´ U-shape ª cantilever beam.
Nanotech Conference Proceedings are now published in the TechConnect Briefs