MSM 99
MSM 99
Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems

Implant and Diffusion Modeling Chapter 10

Linking of Atomistic Modeling to Macroscopic Behavior for Front End Processes

Authors: S.T. Dunham

Affilation: Boston University, United States

Pages: 355 - 358

Keywords: diffusion, point defects, lattice Monte Carlo, transient enhanced diffusion, extended defects

In this work, we review efforts to make effective use of atomistic calculations for the advancement of VLSI process simulation. We focus on front-end processes such as defect mediated dopant diffusion which play a large role in determining device behavior.

ISBN: 0-9666135-4-6
Pages: 697