Authors: G. Li, T. Hubbard and E.K. Antonsson
Affilation: Daltech-Dalhousie University, Canada
Pages: 356 - 361
Keywords: MEMS, micromachines, silicon, simulations, etching.
This paper presents an interactive on-line wet etch simulator (SEGS) which predicts the etched shape as a function of time for arbitrary isotropic or anisotropic etchants and any initial mask shape. Using any Javaenabled web browser users can draw initial masks, choose the etchant, simulate the etching, and view animation results. SEGS can be accessed athttp://mira.me.tuns.ca/
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