Nanotech 2002 Vol. 1
Nanotech 2002 Vol. 1
Technical Proceedings of the 2002 International Conference on Modeling and Simulation of Microsystems

Process Modeling Chapter 8

Gas Flow Simulation in a PECVD Reactor

Authors: A.N.R. da Silva and N.I. Morimoto

Affilation: LSI – EPUSP, Brazil

Pages: 434 - 437

Keywords: PECVD, CFD, gas flow simulation

In this work are presented the gas flo simulation in a hand made PECVD-TEOS reactor. We used the FLOTRAN-CFD code of the ANSYS simulator to predict the velocity and temperature curves in the reactor. The results showed high influence of the reactor geometry and the deposition process pressure in the velocity distribution curves.

ISBN: 0-9708275-7-1
Pages: 764