Authors: A.N.R. da Silva and N.I. Morimoto
Affilation: LSI – EPUSP, Brazil
Pages: 434 - 437
Keywords: PECVD, CFD, gas flow simulation
In this work are presented the gas flo simulation in a hand made PECVD-TEOS reactor. We used the FLOTRAN-CFD code of the ANSYS simulator to predict the velocity and temperature curves in the reactor. The results showed high influence of the reactor geometry and the deposition process pressure in the velocity distribution curves.
Nanotech Conference Proceedings are now published in the TechConnect Briefs