Authors: H. Jung, O. Kwon, S. Yoon and T. Won
Affilation: Inha University, Korea
Pages: 422 - 425
Keywords: level set method, process simulation, modeling
In this paper, we report a novel method for effectively reducing the amount of calculation for a deposition rate at a specific level-set node. The proposed algorithm makes it possible to reduce the number of level-set nodes for the same accuracy and convergence. Furthermore, the total CPU time for simulating the surface evolution on the wafer during the plasma deposition process has been reduced approximately by one-ninth of the required CPU time with comparison to the traditional level-set method. The increased number of level-set nodes with closer grid spacing is generally required for the representation of a curved surface such as a contact hole for multi-level interconnections. However, the CPU time for the level-set calculation of the speed function F increases by O(n2) as we increase the node density by O(n).
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