Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems

Process Modeling Chapter 9

Semiempirical Direct Dynamics Trajectory Study of the Si+ (2P) + H2 -> SiH+ + H Reaction

Authors: N. Chaâbane, H. Vach and G.H. Peslherbe

Affilation: CNRS-Ecole Polytechnique, France

Pages: 434 - 437

Keywords: direct dynamics, trajectory study

Silicon chemical vapor deposition (CVD) is widely used in the microelectronic industry for the production of integrated circuits. For the underlying chemical reactions, the dynamical properties of the involved Si-H compounds are of fundamental interest. I

ISBN: 0-9708275-0-4
Pages: 638