Nanotech 2001 Vol. 1
Nanotech 2001 Vol. 1
Technical Proceedings of the 2001 International Conference on Modeling and Simulation of Microsystems

Process Modeling Chapter 9

Layout Verification and Correction of CMOS-MEMS Layouts

Authors: B. Baidya, K. He and T. Mukherjee

Affilation: Carnegie Mellon, United States

Pages: 426 - 429

Keywords: DRC, slotting, CMOS micromachining, micro-loading, slot hole shields, density requirement

The advent of CMOS micromachining has introduced new design rules for fabrication of integrated CMOS-MEMS devices. This paper presents a context dependent DRC algorithm to handle the issues related to pre-fabrication verification of such layouts. In addition, problems related to density control, specific to CMOS-MEMS designs, are discussed. An automatic slotter which introduces MEMS-compatible slot holes is presented and its capability demonstrated. Having such verification and correction tools which address the needs of integrated CMOS-MEMS designs will help reduce inte-grated MEMS design time.

ISBN: 0-9708275-0-4
Pages: 638