Authors: A. Perrin, V. Ananthakrishnan, F. Gao, R. Sarma and G.K. Ananthasuresh
Affilation: University of Pennsylvania, 220 S. 33rd Street, United States
Pages: 136 - 139
Keywords: geometric modeling, heterogeneous modeling, MEMS, feature-based modeling, mask generation
A heterogeneous geometric modeler for microeletromechanical systmes (MEMS) is the focus of this paper. ON the basis of a comprehensive formalism describe in our earlier work, we present a 3-F implementation of the forward (from masks t oa model) and inverse (from model to masks) problems. In order to slve the inverse problem, it is necessary to ensure that the geometric model is compatible with the chosen process. For this purpose, we have developed a feature-based constrained modeler that allows the MEMS designers to build models that are compatible with a process. We have chosen the surface micromachining process to develop the model as well as present a few illustrative examples.
Nanotech Conference Proceedings are now published in the TechConnect Briefs