Authors: C-Y. Lee and E.K. Antonsson
Affilation: California Institute of Technology, United States
Pages: 83 - 86
Keywords: mask-layout synthesis, bulk etching, evolutionary algorithms
An efficient procedure for synthesizing MEMS mask-layouts for a desired 3-D shape is discussed. This method can greatly reduce the number of design and prototype iterations required to produce a desired device. The method is based on evolutionary algorithms, where the locations of vertices in the polygonal mask-layout are optimized, such that the resulting shape is `closest' to the desired shape , . This work has been extended here to include varying the number of vertices in the mask-layout polygon(s), to free the designer from having to make an initial estimate at the complexity of the mask-layout required. Preliminary results are presented.
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