Index of Keywords

high-gradient strong electric field

Microfluidic Device for Conventional and Traveling-Wave Dielectrophoresis

high-index nanocomposites

Laser pyrolysis - a platform technology to produce functional nanoscale materials for a range of applications


Nanoworld Semiconductor Industry - State and Future Challenges of Technology Computer Aided Design

Nanoworld Semiconductor Industry - State and Future Challenges of Technology Computer Aided Design

Inner Sidewall Gate MOSFET with HfO2 gate Dielectric and Pt electrode


Dynamic Behavior Model for High-k MOSFETs


Leakage current in HfO2 stacks: from physical to compact modeling

high-k dielectric

Effects of sub-threshold operation on 32 nm technology node PMOSFETs evaluated from the perspective of two-stage NBTI model

high-K gate dielectric

A New Grounded Lamination Gate (GLG) SOI MOSFET for Diminished Fringe Capacitance Effects

High-k material

A Compact Physical Model for Critical Quantum Mechanical Effects On MOSFET

high-k material

Comprehensive Examination of Threshold Voltage Fluctuations in Nanoscale Planar MOSFET and Bulk FinFET Devices

high-k offset spacer

Impacts of High-k Offset Spacer on 65-nm Node SOI Devices

Novel FD SOI Devices Structure for Low Standby Power Applications

high-K stack

Modeling study of capacitance and gate current in strained High--K Metal gate technology: impact of Si/SiO2/HK interfacial layer and band structure model

high-k/metal gate

Effects of Random Work Function Fluctuations in Nanoszied Metal Grains on Electrical Characteristic of 16 nm High-/Metal Gate Bulk FinFETs

high-power ultrasound

Ultrasonically-Assisted Preparation and Functionalization of Graphene


Ab Initio Molecular Dynamics Study of the Pressure Induced Phase Transformations in Cristobalite

Nano-Diamond compressibility at pressures up to 85 GPa


Advancements in Microelectronics-Grade Carbon Nanotube Materials for NRAM® Device Manufacture and Analysis of Carbon Nanotube Mass in End User Devices

High-Q resonator

Design of MEMS Tunable Capacitor all Metal Microstructure for RF Wireless Applications