NSTI Nanotech 2009

Systematic Study of Nanoscale Resolution for Low-Energy Electron Beam Lithography

M.A. Mohammad, Zs. Szabó, T. Fito, J.M. Lee, J. Chen, M. Aktary, S.K. Dew, M. Stepanova
National Institute for Nanotechnology, CA

Keywords: low energy electron-beam lithography, cold development of photoresist, dense nanoscale patterning optimization, modeling and simulation


Low energy electron beam lithography (EBL) has the potential to increase throughput and decrease proximity, damage and cost but can suffer from reduced resolution. We examine the effects of process parameters, particularly development conditions, both experimentally and using a new theoretical treatment for dense PMMA structures.
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