2008 NSTI Nanotechnology Conference and Trade Show - Nanotech 2008 - 11th Annual

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Periodic Nanowell Array using Template-Assisted Nanosphere Lithography

S. Jung, J. Lee
Seoul National University, KR

template assisted nanosphere lithography, nanoimprint lithography

This paper presents a template-assisted nanosphere lithography(NSL) to obtain high-quality crystal in regularity and coverage(Figure 1). A periodic array of 100-nm deep, 360-450 nm wide nano-trenches was fabricated by nano imprint lithography(NIL), and used as the template. When polystyrene nanoshperes were spin coated on the substrate with the template morphology, they formed a crystal array with improved periodicity in lateral and longitudinal directions. We also demonstrate nanowell array through subsequent deposition and lift-off steps.

Nanotech 2008 Conference Program Abstract