2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Kaufman & Robinson, Inc.

Kaufman & Robinson, Inc.

With our prominent ion source designs installed in thousands of installations worldwide, Kaufman & Robinson offers its next generation of commercial ion and plasma source products.

 Our  products are stable and precision process tools employed in the fabrication of materials with atomic level control.  Whether plasma cleaning, ion etching, ion beam deposition or ion assisted deposition, our products enable the process engineer to create structures with critical dimensions, ranging from the micrometer to sub-nanometer scale.

KRI offers a range of product technology which can be matched to meet the process objective:

  • Gridless Ion/Plasma Source Technology
  • Gridded Ion Beam Technology
  • RF Plasma Source Technology
  • Electron Source Technology

Booth: 103

Web site:

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