2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Systine Inc.

H.P. Gillis
Systine Inc., US


Systine has developed a fundamentally new etching process, Low Energy Electron Enhanced Etching (LE4), that uses electrons and neutral chemical species, instead of energetic ions, to etch materials to sub 20nm dimensions and to atomic smoothness. The LE4 technology is protected by 6 patents, additional patent applications, and trade secrets.

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Sessions Sunday Monday Tuesday Wednesday Thursday Authors Keywords

Nanotech 2007 Conference Program Abstract


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