2007 NSTI Nanotechnology Conference and Trade Show - Nanotech 2007 - 10th Annual

Characterization of Novel nanostructure and magnetic properties of Co-Fe-Hf-O films

Nguyen Duy Ha
Leiden University, NL

CoFeHfO thin films, Excellent electrical and magnetic properties, High-frequency applications

Influences of partial pressure of oxygen (PO2) on the microstructural and magnetic properties of sputtered Co-Fe-Hf-O films have been studied. It is shown that the PO2 = 6 – 11.5% films with large saturation magnetization, 4 Ms ~ 18 – 21 kG, large hard-axis anisotropy field, HK ~ 30 – 84 Oe, and high electrical resistivity ( ~ 1400 – 3600 cm) are the excellent candidate materials for high-frequency applications of micromagnetic devices, such as magnetic thin film inductors, transformers, and thin film flux gate sensors. In particular, the superior soft magnetic properties of Co19.35Fe53.28Hf7.92O19.35 nanocomposite films of 50 – 437 nm thickness in addition of the high electrical resistivity make them ideal for uses in micromagnetic devices with an opening bandwidth of several gigahertzes. This is attributed to the formation of a peculiar nanostructure in these samples. A magnetic phase separation appears to occur strongly as the film thickness increases over 437 nm, which, in turn, modify the high-frequency magnetic behavior of the Co19.35Fe53.28Hf7.92O19.35 film.

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