Nanotechnology Conference and Trade Show - Nanotech 2006
> Program > Technical Conferences > Business & Development > Nano Impact Workshop > Nanotech Job Fair > Expo
Index of Authors
Index of Keywords
Confirmed Speakers
Conferences & Symposia

Conference Proceedings

Conference Technical Proceedings

Simulation of filling of microfluidic devices using a coarse-grained continuum contact angle model

C. Narayanan and D. Lakehal

contact angle, filling, level sets, multiphase

We present a new dynamic contact angle model applied to the filling
problem in microfluidic devices. The level-set method is used for
interface capture. Several attempts have been made in the past decades to model contact--line dynamics within the continuum fluid dynamics framework. Generally, ad--hoc models are used where contact angles are prescribed based on front velocities and criteria for advancing and receding scenarios. The model presented in this study is based on the molecular dynamics description of the contact--line, such that it does not require the specification of ad--hoc contact angles. Figure 1 presents a simulation of return to equilibrium of a wetting liquid (initial contact angle: $150^o$,
equilibrium $60^o$.
Bubble entrapment is an common problem in the design of microfluidic devices. Occurrence of these bubbles can be avoided through careful design of the chip geometry, control of the filling process, and selection of material properties (hydrophobic or hydrophilic). Simulation of casting of prepolymers on to a master to create stamps for microcontact processing is shown in Fig. 1. The simulation shows that the properties of the polymer and flow rates have to adjusted to avoid bubble entrapment. The paper will present further applications of the level-set, dynamic contact model to filling problems in micro--devices.

Back to Program

Sessions Sunday Monday Tuesday Wednesday Thursday Authors

Nanotech 2006 Conference Program Abstract

Nanotechnology Conference | Terms of use | Privacy policy | Contact | NSTI Home
Program | Technical Conferences | Business & Development | Nano Impact Workshop | Nanotech Job Fair | Expo |
Nanotech 2006 Home | Press Room | Venue | Subscribe | Site Map
Names, and logos of other organizations are the property of those organizations and not of NSTI.
This event is not open to the general public and NSTI reserves the right to refuse admission and participation to any individual.