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Preparation of PZT nanodots on Nano-Templated Substrates

M.J.A. McMillen, A. Lookman, C. Douglas, P. Evans, R.M. Bowman, J.M. Gregg and R.J. Pollard
Queen's University, Belfast & Nanotec NI, UK

ferroelectric, PZT, nanodots, substrates

There is considerable interest in creation of nanoscale capacitor arrays. For example, in FeRAM technology, which has great potential, significant capacitor cell size reduction and transition to 3D structures, can be achieved within existing CMOS procedures. However, cheap and simple methods to create nanoscale capacitors would be attractive. Lead zirconate titanate (PZT) films were deposited on alumina substrates using a solution deposition method involving dip-coating. The method was based on the precalcination of oxides, which were then dissolved in nitric acid. XRD ƒáƒ(2ƒá scans showed that deposition improved with higher concentrations of PZT solution. AFM roughness analysis of the as-deposited films gave an r.m.s. roughness of approximately 39 nm, which was found to improve to approximately 6 nm on postannealing. TEM imaging and EDX elemental analysis confirmed the presence of PZT on the deposited samples. Having found the optimum conditions for solution deposition, nanodots were prepared by deposition on porous anodic alumina substrate templates. Further TEM imaging and EDX elemental analysis showed the presence of the PZT nanodots aligned with the pores (Figure 1). In this paper further details of the integration of electrodes and functional properties will be presented and analysed.

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