Nano Science and Technology Institute
Nanotech 2014 Vol. 3
Nanotech 2014 Vol. 3
Nanotechnology 2014: Electronics, Manufacturing, Environment, Energy & Water
Chapter 3: Materials for Sustainability & Efficiency

Three-Dimensional High-order Nano-rod Formation Using a Hydrogen-assisted Deep Reactive Ion Etching

Authors:S. Soleimani, S. Zanganeh, S. Azimi, Z. Sanaee, S. Mohajerzadeh and H. Taghinejad
Affilation:University of Tehran, IR
Pages:190 - 193
Keywords:nano-rods, 3-D features, amorphous silicon
Abstract:We report the formation of three-dimensional nano-sized vertical features on amorphous silicon by means of a hydrogen-assisted deep reactive ion etching. The thickness of amorphous silicon has been varied between 5 and 10 µm. The adhesion quality of relatively thick amorphous Si films has allowed deep micro and nano-machining features on silicon and glass substrates. Apart from optical photo-lithography, high precision nano-sphere colloidal lithography and electron beam lithography has been exploited to realize ultra-small features on the amorphous silicon. Scanning electron microscopy has been extensively used to study the evolution of three-dimensional features. Such 3-D structures are suitable for future MEMS-based devices on glass and silicon substrates.
Order:Mail/Fax Form
© 2017 Nano Science and Technology Institute. All Rights Reserved.
Terms of Use | Privacy Policy | Contact Us | Site Map