Milling Process Control with Dimensional Feedback on a Focused Ion Beam - Scanning Electron Microscope System (FIB-SEM)

	Nanotech 2012 Vol. 2 Nanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational (Volume 2) Chapter 7: NanoFab: Manufacturing & Instrumentation
	Milling Process Control with Dimensional Feedback on a Focused Ion Beam - Scanning Electron Microscope System (FIB-SEM)
Authors:	J.E. Sanabia
Affilation:	Raith USA, Inc., US
Pages:	463 - 465
Keywords:	FIB, SEM, FIB-SEM, FIB/SEM, nanofabrication, metrology, milling, pattern, lithography
Abstract:	In nanofabrication and nanoanalysis, focused ion beam – scanning electron microscope (FIB-SEM) systems are increasingly used for demanding patterning tasks which rely on precise pattern placement and/or dimension control. Easily verifying and correcting for patterning accuracy during the FIB milling process in an automated fashion has previously not been possible. Here we present the use of a dedicated lithography platform on a commercially available FIB-SEM system for controlling the critical dimension during a FIB milling process. This has been achieved by controlling FIB-SEM system’s stage, the ion optics, and the electron optics through a single software interface.
ISBN:	978-1-4665-6275-2
Pages:	878
Hardcopy:	$209.95

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