Authors: T. Yamashita, F. Kodara, M. Mino, Y. Matsuzawa, K. Okano
Affilation: Tokyo University of Science, Japan
Pages: 291 - 294
Keywords: polyimide, surface modification, photochemistry, relief, wettability
Manufacturing devices with printing technique is one of the key steps in developing printable and flexible electronics or photonics technology. But printing fine structure with ink jet technique is relatively limited because positional precision and size of an ink droplet are not smaller than several microns. One of the innovational solution for those problems is the combination of photolithography with fine resolution and ink jet technique, where surface wettability contrast is photolithographcally patterned with precision then droplets of ink should spread along the patterned area during ink jet process. We prepared novel polyimides whose surface wettability can be changed by photoirradiation, and the degree of surface contact angle of water is as small as 10° after the photoirradiation, based on the chemically amplified reaction of t-BOC group. Surface free energy of a transparent polyimide PI(PMDA/DCHM) can be easily modified by EB or UV irradiation through the oxidation of aliphatic amine moiety. Surface relief of conventional polyimides such as PI(PMDA/ODA) also can be easily patterned only by the photoirradiation and the following thermal treatment without development process. The surface relief pattern is controllable as positive tone or negative by the selection of PBG or PAG.