Nanotech 2012 Vol. 2
Nanotech 2012 Vol. 2
Nanotechnology 2012: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational (Volume 2)

Compact Modeling Chapter 10

On the Variability of HfOx RRAM: From Numerical Simulation to Compact Modeling

Authors: X. Guan, S. Yu, H.-S.P. Wong

Affilation: Stanford University, United States

Pages: 815 - 820

Keywords: resistive switching, memory, hafnium oxide, variation

Abstract:
The trap-assisted conduction and filamentary switching mechanisms of the HfOx based resistive memory are studied. A numerical simulator is developed to reproduce the experimental I-V curves. Comparison with experiments shows that the cycle-to-cycle variation in the RRAM is mainly due to the variation in the gap distance between the filament tips and the electrode. A set of analytical equations suitable for compact modeling is then derived to capture the switching behavior of metal oxide-based RRAM (OxRRAM). Through the introduction of random perturbations of the gap size, the model successfully reproduces the measured resistance variation of the multi-level RRAM cell.


ISBN: 978-1-4665-6275-2
Pages: 878
Hardcopy: $209.95

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