Nano Science and Technology Institute
Nanotech 2011 Vol. 2
Nanotech 2011 Vol. 2
Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational
 
Chapter 4: NanoFab: Manufacturing & Instrumentation
 

Picosun SUNALE™ ALD process tools for nanoscale coatings – seamless transition from R&D to industrial production

Authors:M. Toivola, P.J. Soininen, T. Lehto, T. Pilvi
Affilation:Picosun Oy, FI
Pages:216 - 219
Keywords:atomic layer deposition, nanocoatings, upscaling, high volume manufacturing
Abstract:Atomic Layer Deposition (ALD) offers a superior way to coat highly conformal, uniform, pinhole and defect free thin films on even the most challenging nanoscale architectures. The technique has tremendous potential in several fields of nano/microtechnology, for example in micro/optoelectronics, optics, catalyst manufacturing, corrosion protection, water purification, renewable and clean energy applications such as solar power, fuel cell/hydrogen/battery technology and innovative packaging materials. Picosun is a Finnish, globally operating ALD system manufacturer with world-wide sales and service organization. The company’s core business mission is to develop and manufacture ALD equipment which, with their uniquely scalable and flexible design, answer the needs of both the R&D field and those of high profile industries, thus bridging the gap between research and production and enabling yet more successfull nanotechnology solutions to tomorrow’s clean, sustainable and renewable energy technologies.
ISBN:978-1-4398-7139-3
Pages:854
Hardcopy:$199.95
 
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