Nanotech 2011 Vol. 2
Nanotech 2011 Vol. 2
Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational

NanoFab: Manufacturing & Instrumentation Chapter 4

Patterning Technology for Nanomanufacturing

Authors: H.I. Smith, M. Walsh, F. Zhang, G. Hourihan, J. Ferrera, M. Jaspan

Affilation: LumArray, United States

Pages: 196 - 199

Keywords: lithography, patterning, manufacturing

Abstract:
We describe a new approach to patterning that circumvents the limitations of techniques that were developed for the semiconductor industry. The new approach, zone-plate-array lithograhy (ZPAL)will enable an expansion of applications of nanoscale science and engineering

Patterning Technology for Nanomanufacturing

ISBN: 978-1-4398-7139-3
Pages: 854
Hardcopy: $199.95