![]() | Nanotech 2011 Vol. 2
Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational
Chapter 4: NanoFab: Manufacturing & Instrumentation |
Patterning Technology for Nanomanufacturing | |
| Authors: | H.I. Smith, M. Walsh, F. Zhang, G. Hourihan, J. Ferrera, M. Jaspan |
| Affilation: | LumArray, US |
| Pages: | 196 - 199 |
| Keywords: | lithography, patterning, manufacturing |
| Abstract: | We describe a new approach to patterning that circumvents the limitations of techniques that were developed for the semiconductor industry. The new approach, zone-plate-array lithograhy (ZPAL)will enable an expansion of applications of nanoscale science and engineering |
| ISBN: | 978-1-4398-7139-3 |
| Pages: | 854 |
| Hardcopy: | $199.95 |
| Order: | Mail/Fax Form |
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