Nano Science and Technology Institute
Nanotech 2011 Vol. 2
Nanotech 2011 Vol. 2
Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational
Chapter 4: NanoFab: Manufacturing & Instrumentation

Patterning Technology for Nanomanufacturing

Authors:H.I. Smith, M. Walsh, F. Zhang, G. Hourihan, J. Ferrera, M. Jaspan
Affilation:LumArray, US
Pages:196 - 199
Keywords:lithography, patterning, manufacturing
Abstract:We describe a new approach to patterning that circumvents the limitations of techniques that were developed for the semiconductor industry. The new approach, zone-plate-array lithograhy (ZPAL)will enable an expansion of applications of nanoscale science and engineering
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