Nanotech 2011 Vol. 2
Nanotech 2011 Vol. 2
Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational

NanoFab: Manufacturing & Instrumentation Chapter 4

Application of focused ion beam technology for photonic nanostructures

Authors: F. Ay, V.J. Gadgil, D. Geskus, S. Aravazhi, K. Wörhoff, M. Pollnau

Affilation: MESA+ institute of nanotechnology, University of Twente, Netherlands

Pages: 200 - 203

Keywords: FIB, photonic devices

Abstract:
Al2O3 and KY(WO4)2 are promising materials for photonic applications with excellent optical properties and of interest for obtaining on chip resonator structures. However, there is no method available to fabricate these structures except FIB technology. We will discuss strategies to optimize the nano-structuring processes that are strongly dependent on the geometry of the desired structure. Furthermore, we will report our recent results on utilization and optimization of the focused ion beam technique for fabrication of nano-structures in integrated photonic devices on several material platforms such as amorphous Al2O3 and crystalline KY(WO4)2

Application of focused ion beam technology for photonic nanostructures

ISBN: 978-1-4398-7139-3
Pages: 854
Hardcopy: $199.95