Nanotech 2011 Vol. 2
Nanotech 2011 Vol. 2
Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational

NanoFab: Manufacturing & Instrumentation Chapter 4

Polarisation stabilisation of telecom lasers by minimally-invasive direct-write focused electron beam induced deposition

Authors: I. Utke, M.G. Jenke, C. Roeling, P.H. Thiesen, V. Iakovlev, A. Sirbu, A. Mereuta, A. Caliman, E. Kapon

Affilation: EMPA, Swiss Federal Laboratories for Materials Science and Technology, Switzerland

Pages: 224 - 225

Keywords: focused electron beam induced deposition, FEBID, VCSEL, polarization

Abstract:
The possibility to deposit or remove very small amounts of material for tuning purposes on a fully processed micro/nanodevice at the right place, at will, and without damage to surrounding sensitive areas can be very cost effective even if the speed of the deposition (or etching) is very low compared to standard photolithography. Here, we describe an emerging direct-write nanoscale patterning concept, based on gas-assisted focused electron beam induced deposition (FEBID), which enables local deposition of conductive material for refining the performance of a vertical-cavity surface-emitting laser (VCSEL) in a single post-process step.


ISBN: 978-1-4398-7139-3
Pages: 854
Hardcopy: $199.95

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