Sub-wavelength metal nanostructure fabrication by parallel dip-pen nanolithography

	Nanotech 2011 Vol. 2 Nanotechnology 2011: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational Chapter 2: Nanostructured Materials & Devices
	Sub-wavelength metal nanostructure fabrication by parallel dip-pen nanolithography
Authors:	J-W Jang, S. Nettikadan
Affilation:	NanoInk Inc, US
Pages:	92 - 95
Keywords:	dip pen nanolithography, metamaterials, parallel
Abstract:	Metal nanostructures in sub-wavelength scale have attracted interests in materials engineering and optics research. Metal nanostructures in sub-wavelength scale have been used as plasmonic diffraction gratings and negative index metamaterials. E-beam lithography has been commonly used to fabricate those metal nanostructures; however, e-beam lithography has limitation in scale-up of nanostructure fabrication and is expensive. In this study, the low cost and convenient scale-up fabrication method for metal nanostructures using Dip Pen Nanolithography® (DPN®) is demonstrated. DPN was used to deposit alkanethiol patterns, which were then used as can be used as etch resists for top-down nanofabrication processes to generate Au nano-features. As a proof of concept, arrays of three different designed double-ring Split-Ring Resonators (SRRs) were fabricated by 1D DPN printing.
ISBN:	978-1-4398-7139-3
Pages:	854
Hardcopy:	$199.95

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