A Novel Method for Measuring the Sizes and Concentrations of 5-500 nm Particles in Colloidal Suspensions

	Nanotech 2011 Vol. 1 Nanotechnology 2011: Advanced Materials, CNTs, Particles, Films and Composites Chapter 1: Nanoscale Materials Characterization
	A Novel Method for Measuring the Sizes and Concentrations of 5-500 nm Particles in Colloidal Suspensions
Authors:	H.G. Van Schooneveld, M.R. Litchy, D.G. Grant
Affilation:	CT Associates, Inc, US
Pages:	41 - 44
Keywords:	Colloidal suspensions, liquid filter retention, CPM slurry
Abstract:	A new measurement technique has been developed that allows for measurement of particles as small as 5 nanometers in colloidal suspensions. The technique has demonstrated the ability to provide unique and useful particle size distribution (PSD) data for chemical/mechanical planarization (CMP) slurries used heavily in the micro-electronics industry. The ability to measure filter retention of particles in the 10-20 namometer size range has also been demonstrated.
ISBN:	978-1-4398-7142-3
Pages:	882
Hardcopy:	$199.95

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