Nanotech 2011 Vol. 1
Nanotech 2011 Vol. 1
Nanotechnology 2011: Advanced Materials, CNTs, Particles, Films and Composites

Nanoscale Materials Characterization Chapter 1

A Novel Method for Measuring the Sizes and Concentrations of 5-500 nm Particles in Colloidal Suspensions

Authors: H.G. Van Schooneveld, M.R. Litchy, D.G. Grant

Affilation: CT Associates, Inc, United States

Pages: 41 - 44

Keywords: Colloidal suspensions, liquid filter retention, CPM slurry

Abstract:
A new measurement technique has been developed that allows for measurement of particles as small as 5 nanometers in colloidal suspensions. The technique has demonstrated the ability to provide unique and useful particle size distribution (PSD) data for chemical/mechanical planarization (CMP) slurries used heavily in the micro-electronics industry. The ability to measure filter retention of particles in the 10-20 namometer size range has also been demonstrated.

A Novel Method for Measuring the Sizes and Concentrations of 5-500 nm Particles in Colloidal Suspensions

ISBN: 978-1-4398-7142-3
Pages: 882
Hardcopy: $199.95