Authors: H.G. Van Schooneveld, M.R. Litchy, D.G. Grant
Affilation: CT Associates, Inc, United States
Pages: 41 - 44
Keywords: Colloidal suspensions, liquid filter retention, CPM slurry
A new measurement technique has been developed that allows for measurement of particles as small as 5 nanometers in colloidal suspensions. The technique has demonstrated the ability to provide unique and useful particle size distribution (PSD) data for chemical/mechanical planarization (CMP) slurries used heavily in the micro-electronics industry. The ability to measure filter retention of particles in the 10-20 namometer size range has also been demonstrated.