Nanotech 2010 Vol. 2
Nanotech 2010 Vol. 2
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational

MEMS Fab: Design, Manufacture, Instrumentation Chapter 5

Maskless Lithography Using Patterned Amorphous Silicon Layer Induced by Femtosecond Laser Irradiation

Authors: A. Kiani, K. Venkatakrishnan, B. Tan

Affilation: Ryerson University, Canada

Pages: 276 - 279

Keywords: maskless lithography, amorphous silicon, femtosecond laser

Abstract:
In this research, we reported a maskless lithography method by a combination of laser amorphization of silicon and wet alkaline etching. This technique can lead to a promising solution for maskless lithography because in comparison to the previous techniques, it involves less processing steps and requires simple equipment configuration. Scanning Electron Microscope (SEM), a Micro-Raman and Energy Dispersive X-ray (EDX) spectroscopy analyses were used to evaluate the quality of amorphous layer and the etching process.


ISBN: 978-1-4398-3402-2
Pages: 862
Hardcopy: $189.95

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