Nano Science and Technology Institute
Nanotech 2010 Vol. 2
Nanotech 2010 Vol. 2
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational
 
Chapter 5: MEMS Fab: Design, Manufacture, Instrumentation
 

Influence of resist composition on demolding force in UV nanoimprint lithography

Authors:A. Amirsadeghi, J. Lee, S. Park
Affilation:Louisiana State University, US
Pages:272 - 275
Keywords:nano imprint lithography, UV, demolding force, Young’s modulus
Abstract:We investigated the influence of the Young’s Modulus (E) of UV resist on the measured demolding force in UV-NIL by varying compositions of UV-curable polymers. We found that decreasing crosslinking content of the polymers decreases the Young’s modulus and polymerization shrinkage and in turn the demolding force.
Influence of resist composition on demolding force in UV nanoimprint lithographyView PDF of paper
ISBN:978-1-4398-3402-2
Pages:862
Hardcopy:$189.95
 
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