Nano Science and Technology Institute
Nanotech 2010 Vol. 2
Nanotech 2010 Vol. 2
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational
Chapter 5: MEMS Fab: Design, Manufacture, Instrumentation

Influence of resist composition on demolding force in UV nanoimprint lithography

Authors:A. Amirsadeghi, J. Lee, S. Park
Affilation:Louisiana State University, US
Pages:272 - 275
Keywords:nano imprint lithography, UV, demolding force, Young’s modulus
Abstract:We investigated the influence of the Young’s Modulus (E) of UV resist on the measured demolding force in UV-NIL by varying compositions of UV-curable polymers. We found that decreasing crosslinking content of the polymers decreases the Young’s modulus and polymerization shrinkage and in turn the demolding force.
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