Nanotech 2010 Vol. 2
Nanotech 2010 Vol. 2
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational

MEMS Fab: Design, Manufacture, Instrumentation Chapter 5

Influence of resist composition on demolding force in UV nanoimprint lithography

Authors: A. Amirsadeghi, J. Lee, S. Park

Affilation: Louisiana State University, United States

Pages: 272 - 275

Keywords: nano imprint lithography, UV, demolding force, Young’s modulus

Abstract:
We investigated the influence of the Young’s Modulus (E) of UV resist on the measured demolding force in UV-NIL by varying compositions of UV-curable polymers. We found that decreasing crosslinking content of the polymers decreases the Young’s modulus and polymerization shrinkage and in turn the demolding force.

Influence of resist composition on demolding force in UV nanoimprint lithography

ISBN: 978-1-4398-3402-2
Pages: 862
Hardcopy: $189.95