Authors: A. Amirsadeghi, J. Lee, S. Park
Affilation: Louisiana State University, United States
Pages: 272 - 275
Keywords: nano imprint lithography, UV, demolding force, Young’s modulus
We investigated the influence of the Young’s Modulus (E) of UV resist on the measured demolding force in UV-NIL by varying compositions of UV-curable polymers. We found that decreasing crosslinking content of the polymers decreases the Young’s modulus and polymerization shrinkage and in turn the demolding force.