Nanotech 2010 Vol. 2
Nanotech 2010 Vol. 2
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational

MEMS Fab: Design, Manufacture, Instrumentation Chapter 5

Influence of resist composition on demolding force in UV nanoimprint lithography
A. Amirsadeghi, J. Lee, S. Park
Louisiana State University, US

Maskless Lithography Using Patterned Amorphous Silicon Layer Induced by Femtosecond Laser Irradiation
A. Kiani, K. Venkatakrishnan, B. Tan
Ryerson University, CA

Micro Crumples for Self-Assembly of Field Emission Devices
S. Sambandan
Palo Alto Research Center, US

Monolithic CMOS MEMS technology development: A piezoresistive-sensors case study
A. Chaehoi, D. Weiland, D. O’Connell, S. Bruckshaw, S. Ray, M. Begbie
Institute for System Level Integration, UK

Practical issues with ion beam milling in acoustic resonator technologies
S. Mishin, Y. Oshmyansky, F. Bi
Advanced Modular Systems, Inc, US

Investigation on correlation between cold/hot weld line mechanical properties and micro injection molding processing parameters
L. Xie, D. Zhu, G. Ziegmann, L. Steuernagel
Technology University of Clausthal, DE

Machining Using Fast Tool Servo Combined with Ultrasonic Vibrator
S.C. Choi, Lu Hong, D.W. Lee
Pusan University, KR


ISBN: 978-1-4398-3402-2
Pages: 862
Hardcopy: $189.95