Nanotech 2010 Vol. 2
Nanotech 2010 Vol. 2
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational

NanoFab: Manufacture, Instrumentation Chapter 4

Nanoscale Graphene Lithography Using an Atomic Force Microscope

Authors: K. Kumar, E.H. Yang

Affilation: Stevens Institute of Technology, United States

Pages: 199 - 201

Keywords: graphene, atomic force microscope, oxidation lithography

Abstract:
In this work, we study Atomic Force Microscope local oxidation lithography to precisely fabricate nanometer-scale structures from graphene, a recently discovered material with exceptional electrical properties. We have systematically studied oxidation parameters (electric field, humidity, setpoint, tip speed, etc) with relation to oxidized feature size to determine the optimal conditions for less than 50 nm pattern line width. Using this optimized technique, we have oxidized nanometer sized features on single and few layer graphene and drawn insulating patterns on highly ordered pyrolyzed graphite. Forthcoming experiments include the patterning of less than 20 nm features on single-layer graphene to create quantum dots for electron transport studies.

Nanoscale Graphene Lithography Using an Atomic Force Microscope

ISBN: 978-1-4398-3402-2
Pages: 862
Hardcopy: $189.95