Nano Science and Technology Institute
Nanotech 2010 Vol. 2
Nanotech 2010 Vol. 2
Nanotechnology 2010: Electronics, Devices, Fabrication, MEMS, Fluidics and Computational
Chapter 10: Computational Methods, Simulation & Software Tools

Electrical Characteristics of 16-nm-Gate Multi-Gate-and-Multi-Fin Devices and Digital Circuits

Authors:H-W Cheng
Affilation:National Chiao Tung University, TW
Pages:721 - 724
Keywords:16-nm, Multi-Gate-and-Multi-Fin Device, modeling, TCAD simulation, electrical characteristics, digital circuit
Abstract:In this work, we estimate electrical characteristics including threshold voltage (Vth) and gate capacitance (Cg) of 16-nm-gate multi-gate-and-multi-fin FETs, and delay time of an inverter and static noise margin (SNM) of a 6T SRAM. Large-scale random-dopant-induced fluctuations of the aforementioned characteristics are further discussed with respect to different fin aspect ratio (AR = the fin height / the effective fin width), where the device characteristics are obtained by solving a set of 3D density-gradient equations coupled with Poisson equations as well as electron-hole current continuity equations [3] under our parallel computing system [4]. Notably, an experimentally validated simulation [5] is also conducted to investigate the fluctuation property.
Electrical Characteristics of 16-nm-Gate Multi-Gate-and-Multi-Fin Devices and Digital CircuitsView PDF of paper
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