Correlation between the oxygen content and the structure of AlCrSiOxN(1-x) thin films deposited by pulsed DC magnetron sputtering

	Nanotech 2010 Vol. 1 Nanotechnology 2010: Advanced Materials, CNTs, Particles, Films and Composites Chapter 4: Nanostructured Coatings, Surfaces & Films
	Correlation between the oxygen content and the structure of AlCrSiOxN(1-x) thin films deposited by pulsed DC magnetron sputtering
Authors:	H. Najafi, A. Karimi, M. Morstein, H. Najafi
Affilation:	École Polytechnique Fédérale de Lausanne, CH
Pages:	631 - 634
Keywords:	oxynitride, pulsed DC sputtering, nanoindentation
Abstract:	Due to their good mechanical properties as well as high temperature oxidation resistance, multi element oxynitride thin films have attracted more attention for applications in cutting and forming tools. Nanocomposite coatings represent a new generation of materials. They are composed of at least two separated phases with a nanocrystalline and/or amorphous structure and New unique physical and functional properties of the nanocomposite coatings are a main driving force stimulating the development of these materials.
ISBN:	978-1-4398-3401-5
Pages:	976
Hardcopy:	$189.95

Order:	Mail/Fax Form
Special:	3 CD Set — 15% off with Free Shipping
Up