Nanotech 2009 Vol. 3
Nanotech 2009 Vol. 3
Nanotechnology 2009: Biofuels, Renewable Energy, Coatings, Fluidics and Compact Modeling

Modeling and Simulation of Micro and Nano Systems Chapter 5

Kinetic Monte Carlo Study on Carbon Trapping Effect with Pre-amorphized Silicon

Authors: S. Park, B. Cho, T. Won

Affilation: Inha University, Korea

Pages: 339 - 342

Keywords: carbon co-implant, pre-amorphization, binary collision approximation, kinetic monte carlo

Abstract:
We report our kinetic Monte Carlo (kMC) study of the effect of carbon co-implant on the pre-amorphization implant (PAI) process. We employed BCA (Binary Collision Approximation) approach for the acquisition of the initial as-implant dopant profile and kMC method for the simulation of diffusion process during the annealing process. The simulation results implied that carbon co-implant suppresses the boron diffusion due to the recombination with interstitials. Also, we could compare the boron diffusion with carbon diffusion by calculating carbon reaction with interstitial. And we can find that boron diffusion is affected from the carbon co-implant energy by enhancing the trapping of interstitial between boron and interstitial.

Kinetic Monte Carlo Study on Carbon Trapping Effect with Pre-amorphized Silicon

ISBN: 978-1-4398-1784-1
Pages: 694
Hardcopy: $179.95