Authors: J. Kim, Y-H Shin, J-H Yun, C-S Han, M.S. Hyun
Affilation: Korea Institute of Machinery and Materials (KIMM), Korea
Pages: 389 - 392
Keywords: Ni silicide, Nanowire, Electric force microscopy (EFM), Nanoscale information
Excellent electric conductive nickel silicide (NiSi) nanowire (NW) was aligned on a conventional Si tip and performed as an electric force microscopy (EFM) probe. Single crystalline structured NiSi NW was grown in plasma-enhanced chemical vapor deposition (PECVD, SNTech, Korea) system. The NW-containing solution was prepared and then dropped in an electric field applying system to position the NiSi NW on a conventional Si cantilever. Experimental and simulation investigations revealed that the modulation of electric field condition may control the number of NW alignment at a designated spot. NiSi NW EFM tip obtained polarity information from a ferroelectric PZT (Lead zirconate titanate) film, which was previously patterned to have 3 different polarities. Moreover, the nanoscale EFM probe achieved the geometric and electric information through a nanoscale interconnect. The NiSi EFM tip has the advantage in fabrication to reduce processing steps comparing to that of the conventional EFM tip, which includes fine machining techniques. We will present the practical application of nanostructure to achieve nanowire-embedding functional microscopy tip. More simple approach is possible to fabricate an EFM cantilever by using an electric conductive nanowire as a tip. It includes the fabrication scheme of NiSi NW EFM tip and performances as well.