Nanotech 2009 Vol. 1
Nanotech 2009 Vol. 1
Nanotechnology 2009: Fabrication, Particles, Characterization, MEMS, Electronics and Photonics

Nano Fabrication Chapter 1

The first Italian micro exposure tool for EUV lithography: design guidelines and experimental results

Authors: F. Flora, S. Bollanti, P. Di Lazzaro, L. Mezi, D. Murra, A. Torre

Affilation: ENEA, Italy

Pages: 33 - 36

Keywords: EUV source, EUVL, laser-plasma, Schwarzschild optic, MET

Abstract:
The first Italian Micro Exposure Tool (MET) for EUV lithography has been developed at the ENEA Research Laboratories in Frascati (Italy). In spite of the very low cost of the Schwarzschild optics, the specific design of the low vibration board and the innovative alignment technique (a modified Foucault technique) applied to the Schwarzschild optics allowed the achievement of a resolution better than 100 nm on a wafer coated with a PMMA photoresist

The first Italian micro exposure tool for EUV lithography: design guidelines and experimental results

ISBN: 978-1-4398-1782-7
Pages: 702
Hardcopy: $179.95