Nano Science and Technology Institute
Nanotech 2009 Vol. 1
Nanotech 2009 Vol. 1
Nanotechnology 2009: Fabrication, Particles, Characterization, MEMS, Electronics and Photonics
 
Chapter 1: Nano Fabrication
 

Focused Ion Beam machining of large and complex nanopatterns

Authors:O. Wilhelmi, L. Roussel, P. Anzalone, D.J. Stokes, P. Faber, S. Reyntjens
Affilation:FEI Company, NL
Pages:24 - 27
Keywords:FIB, DualBeam, rapid prototyping, nanopatterning
Abstract:Modern FIB columns have not only reduced minimum spot sizes, but has also improved beam profiles at large and intermediate FIB currents. Focused ion beams with high beam currents and yet small spot sizes and narrow profiles are opening novel opportunities to expand FIB prototyping to larger areas of complex shapes. The better understanding of adequate strategies for FIB patterning has led to the development of new software for the conversion of complex CAD layouts into data streams optimized for FIB patterning and automated process control. We present the features of the new software which applies for the first time state-of-the-art FIB patterning intelligence to CAD layouts. Depth control of FIB milling through a library of material sputter rates, techniques avoiding redeposition artifacts and the optimized utilization of ion beam induced deposition and gas assisted etching are demonstrated in application examples. These examples will illustrate how new classes of nanotechnology applications can benefit from the direct process control and very short optimization cycles in rapid prototyping with DualBeam instruments.
Focused Ion Beam machining of large and complex nanopatternsView PDF of paper
ISBN:978-1-4398-1782-7
Pages:702
Hardcopy:$179.95
 
Order:Mail/Fax Form
Up
© 2014 Nano Science and Technology Institute. All Rights Reserved.
Terms of Use | Privacy Policy | Contact Us | Site Map