Nanotech 2008 Vol. 3
Nanotech 2008 Vol. 3
Nanotechnology 2008: Microsystems, Photonics, Sensors, Fluidics, Modeling, and Simulation - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 3

Compact Modeling Chapter 7

New Properties and New Challenges in MOS Compact Modeling

Authors: X. Zhou, G.H. See, G. Zhu, Z. Zhu, S. Lin, C. Wei, A. Srinivas, J. Zhang

Affilation: Nanyang Technological University, Singapore

Pages: 750 - 755

Keywords: compact model, multiple-gate, nanowire, MOSFET, unified regional modeling

As bulk-MOS technology is approaching its fundamental limit, non-classical devices such as multiple-gate (MG) and silicon-nanowire (SiNW) transistors emerge as promising candidates for future generation device building blocks. This trend poses new challenges in developing a compact model suitable for these new device structures, and requires a paradigm shift in the core model structure. Conventional bulk-MOS models are based on four-terminal unipolar conduction in a doped channel with ideal symmetrical PN-junction source/drain contacts. In MG/NW MOSFETs, however, the device becomes three-terminal with undoped channel and possible bipolar conduction, and source/drain contacts become an integral part of intrinsic channel. Source/drain asymmetry, either intentional or unintentional, in a theoretically symmetric MOSFET also becomes important to be captured in a compact model, which is nontrivial in a model that depends on terminal source/drain swapping at the circuit level. This paper discusses these new challenges and demonstrates solutions based on the unified regional modeling (URM) approach.

ISBN: 978-1-4200-8505-1
Pages: 940
Hardcopy: $159.95

2015 & Newer Proceedings

Nanotech Conference Proceedings are now published in the TechConnect Briefs

NSTI Online Community