Nanotech 2008 Vol. 3
Nanotech 2008 Vol. 3
Nanotechnology 2008: Microsystems, Photonics, Sensors, Fluidics, Modeling, and Simulation - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 3

Modeling & Simulation of Microsystems Chapter 5

Simulation of Field-Plate Effects on Lag and Current Collapse in GaN-based FETs

Authors: K. Itagaki, A. Nakajima, K. Horio

Affilation: Shibaura Institute of Technology, Japan

Pages: 533 - 536

Keywords: GaN, FET, field plate, current collapse, trap

Abstract:
Two-dimensional transient analyses of field-plate GaN MESFETs and AlGaN/GaN HEMTs with a semi-insulating buffer layer have been performed in which a deep donor and a deep acceptor are considered in the buffer layer. Quasi-pulsed I-V curves are derived from the transient characteristics. It is shown that drain lag is reduced by introducing a field plate because trapping effects become smaller. It is also shown that the current collapse and gate lag are also reduced in the field-plate structure. It is suggested that there is an optimum thickness of SiN passivation layer to minimize the buffer-related current collapse and drain lag in GaN-based FETs.


ISBN: 978-1-4200-8505-1
Pages: 940
Hardcopy: $159.95

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