 | Nanotech 2008 Vol. 3
Nanotechnology 2008: Microsystems, Photonics, Sensors, Fluidics, Modeling, and Simulation - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 3
Chapter 4: MEMS & NEMS |
Micromachined Force Sensors for Characterization of Chemical Mechanical Polishing | |
| Authors: | D. Gauthier, A. Mueller, R. White, V. Manno, C. Rogers, S. Anjur, M. Moinpour |
| Affilation: | Tufts University, US |
| Pages: | 462 - 465 |
| Keywords: | MEMS, force sensors, chemical mechanical polishing, CMP |
| Abstract: | Two types of microscale sensors are being developed to take in situ measurements of forces induced during chemical mechanical polishing. Flexible post sensors have been demonstrated, and floating element sensors are under development. Both sensors will be included in this presentation. Presenting Author: Douglas Gauthier |
| ISBN: | 978-1-4200-8505-1 |
| Pages: | 940 |
| Hardcopy: | $159.95 |
| Order: | Mail/Fax Form |
| Special: | 3 CD Set — 15% off with Free Shipping |
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