Nanotech 2008 Vol. 3
Nanotech 2008 Vol. 3
Nanotechnology 2008: Microsystems, Photonics, Sensors, Fluidics, Modeling, and Simulation - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 3

MEMS & NEMS Chapter 4

Micromachined Force Sensors for Characterization of Chemical Mechanical Polishing

Authors: D. Gauthier, A. Mueller, R. White, V. Manno, C. Rogers, S. Anjur, M. Moinpour

Affilation: Tufts University, United States

Pages: 462 - 465

Keywords: MEMS, force sensors, chemical mechanical polishing, CMP

Abstract:
Two types of microscale sensors are being developed to take in situ measurements of forces induced during chemical mechanical polishing. Flexible post sensors have been demonstrated, and floating element sensors are under development. Both sensors will be included in this presentation. Presenting Author: Douglas Gauthier


ISBN: 978-1-4200-8505-1
Pages: 940
Hardcopy: $159.95

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