Nano Science and Technology Institute
Nanotech 2008 Vol. 3
Nanotech 2008 Vol. 3
Nanotechnology 2008: Microsystems, Photonics, Sensors, Fluidics, Modeling, and Simulation - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 3
 
Chapter 4: MEMS & NEMS
 

Micromachined Force Sensors for Characterization of Chemical Mechanical Polishing

Authors:D. Gauthier, A. Mueller, R. White, V. Manno, C. Rogers, S. Anjur, M. Moinpour
Affilation:Tufts University, US
Pages:462 - 465
Keywords:MEMS, force sensors, chemical mechanical polishing, CMP
Abstract:Two types of microscale sensors are being developed to take in situ measurements of forces induced during chemical mechanical polishing. Flexible post sensors have been demonstrated, and floating element sensors are under development. Both sensors will be included in this presentation. Presenting Author: Douglas Gauthier
Micromachined Force Sensors for Characterization of Chemical Mechanical PolishingView PDF of paper
ISBN:978-1-4200-8505-1
Pages:940
Hardcopy:$159.95
 
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