Nanotech 2008 Vol. 3
Nanotech 2008 Vol. 3
Nanotechnology 2008: Microsystems, Photonics, Sensors, Fluidics, Modeling, and Simulation - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 3

Sensors & Systems Chapter 2

Nano-gap high quality factor thin film SOI MEM resonators

Authors: D. Grogg, C.H. Tekin, D.N. Badila-Ciressan, D. Tsamados, M. Mazza, M.A. Ionescu

Affilation: Ecole Polytechnique Fédérale de Lausanne, Switzerland

Pages: 215 - 218

Keywords: microelectromechanical systems, MEMS, electrostatic devices, resonators, quality factor (Q)

Abstract:
A 1.25 m thin SOI micro-electro-mechanical (MEM) resonator with a quality factor of 100’000 at 24.6 MHz is demonstrated. A nanogap fabrication process allows the fabrication of < 200 nm gaps, allowing for low polarization voltages. A motional resistance of 55 k is measured at 18 V DC polarization and values still below 100 k can be measured at 14 V.

Nano-gap high quality factor thin film SOI MEM resonators

ISBN: 978-1-4200-8505-1
Pages: 940
Hardcopy: $159.95