Nano Science and Technology Institute
Nanotech 2008 Vol. 3
Nanotech 2008 Vol. 3
Nanotechnology 2008: Microsystems, Photonics, Sensors, Fluidics, Modeling, and Simulation - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 3
 
Chapter 1: Photonics & Nanowires
 

Simulation and Fabrication of Large Area 3D Nanostructures

Authors:K.H.A. Bogart, I. El-kady, R.K. Grubbs, K. Rahimian, A.M. Sanchez, A.R. Ellis, M. Wiwi, F.B. McCormick, D. J.-L. Shir, J.A. Rogers
Affilation:Sandia National Laboratories, US
Pages:9 - 12
Keywords:nanostructure, nano-fabrication, photonic lattice, periodicity, soft lithography
Abstract:Three-dimensional (3D) nano-structures are vital for emerging technologies such as photonics, sensors, fuel cells, catalyst supports, and data storage. The Proximity-field nanoPatterning1 method generates complex 3D nanostructures using a single exposure and development cycle. Exposure through an elastomeric “phasemask” patterned in x, y, and z (dimensions~ exposure wavelength) generates a complex 3D light-intensity distribution due to diffraction (Abbe theory) and the Talbot effect (self-imaging) that patterns underlying photoresist in 3-dimensions. Our goals are to create full models of this process and scale fabrication to 150mm. We developed a model that predicts the phase mask required to generate a specific desired nanostructure. We have compared this inverse model with experimental 3D structures to test the validity of the simulation. We have transferred the PnP fabrication process to a class-10 commercial cleanroom and scaled-up the processed area to >2000mm2, tested photopolymer additives designed to reduce resist shrinkage, incorporated atomic layer deposition (ALD) to coat the 3D patterned resist with metals/metal-oxides improve structure robustness, and generated quasi-crystal patterned 3D nanostructures. We are investigating large-area approaches to 2-photon patterning2 of 3D structures. The successful creation of the phase mask for a particular desired device structure and the scale-up to commercially viable areas enables this method to be utilized for actual device (e.g. photonic lattices) fabrication. References 1. PNAS 101, 12728 (2004). 2. Opt. Express, 14 2300 (2006)
Simulation and Fabrication of Large Area 3D NanostructuresView PDF of paper
ISBN:978-1-4200-8505-1
Pages:940
Hardcopy:$159.95
 
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