Authors: J. Zhu, H. Bart-Smith, M.R. Begley, R.G. Kelly, G. Zangari, M.L. Reed
Affilation: University of Virginia, United States
Pages: 592 - 595
Keywords: nanomachining, gold nanoparticles, nanoporous
We report an efficient method for fabricating nanoporous structures in crystalline silicon, using colloidal gold nanoparticles in HF/H2O2 etchant. Colloidal gold in HF/H2O2 solutions accelerates the etching rate by two orders of magnitude and simultaneously introduces anisotropy in the etching process, with preferential penetration along the directions. Random nanoporous structure, tailored nanochannel and nanopore were developed with this method.