Nanomaching of Silicon nanoporous Structures by Colloidal Gold Nanoparticle

	Nanotech 2008 Vol. 1 Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1 Chapter 4: Nanofabrication & Direct-Write Nanolithography
	Nanomaching of Silicon nanoporous Structures by Colloidal Gold Nanoparticle
Authors:	J. Zhu, H. Bart-Smith, M.R. Begley, R.G. Kelly, G. Zangari, M.L. Reed
Affilation:	University of Virginia, US
Pages:	592 - 595
Keywords:	nanomachining, gold nanoparticles, nanoporous
Abstract:	We report an efficient method for fabricating nanoporous structures in crystalline silicon, using colloidal gold nanoparticles in HF/H2O2 etchant. Colloidal gold in HF/H2O2 solutions accelerates the etching rate by two orders of magnitude and simultaneously introduces anisotropy in the etching process, with preferential penetration along the directions. Random nanoporous structure, tailored nanochannel and nanopore were developed with this method.
ISBN:	978-1-4200-8503-7
Pages:	1,118
Hardcopy:	$159.95

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